體積全像光學元件的折射率分布量測

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姓名

李淇合(CHI-HO,LEE) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

體積全像光學元件的折射率分布量測
(Refractive Index Distribution Measurement of Volume Holographic Optical Elements)

相關論文

★ N 倍繞射效率之體積全像多工技術	★ 使用體積全像光學波導之可變焦無透鏡數位全像顯微鏡
★ 體積全像光學元件之波長及角度選擇性

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至系統瀏覽論文 (2030-2-1以後開放)

摘要(中)

本研究針對體積全像光學元件(Volume Holographic Optical Element, VHOE)的品質檢測提出了一套新方法。透過設計與記錄體積全像光柵，結合光學繞射斷層掃描(Optical Diffraction Tomography, ODT)技術，實現了 VHOE 相位分布的準確量測及折射率分布重建。在有嚴格控制雜訊的研究結果表示，製程時間的長短對繞射效率的影響不大，但對體積全像光柵品質的影響是極大的。
本研究針對VHOE提出了有效的可視化雜訊分析方法，系統性地探討這些問題對全像光柵品質的影響，並據此提出製程優化建議。結果表明，透過控制製成環境與參數，可以顯著改善 VHOE 的折射率結構穩定性與光學性能。本方法為高品質 VHOE 的設計與應用提供了實用的分析工具與理論依據，對體積全像光學元件製造領域具有重要的參考價值。

摘要(英)

This study proposes a novel method for quality inspection of Volume Holographic Optical Elements (VHOEs). By designing and recording volume holographic gratings combined with Optical Diffraction Tomography (ODT) technology, accurate measurement of the phase distribution and reconstruction of the refractive index distribution of VHOEs were achieved. Under strict noise control, the results indicate that the duration of the fabrication process has little effect on diffraction efficiency but significantly impacts the quality of the volume holographic grating.
This study introduces an effective visualization-based noise analysis method for VHOEs, systematically exploring the impact of these issues on grating quality and providing process optimization recommendations accordingly. The results demonstrate that by controlling the manufacturing environment and parameters, the refractive index structure stability and optical performance of VHOEs can be significantly improved. This method offers a practical analytical tool and theoretical basis for the design and application of high-quality VHOEs, providing valuable reference significance for the field of volume holographic optical element manufacturing.

關鍵字(中)

★ 折射率分佈量測
★ 體積全像光學元件
★ 光學繞射斷層掃描

關鍵字(英)

★ Refractive index distribution measurement
★ Volume Holographic Optical Elements
★ Optical Diffraction Tomography

論文目次

目錄
摘要 I
ABSTRACT II
致謝 III
目錄 V
圖目錄 VII
表目錄 XII
第一章緒論 1
1-1 背景介紹 1
1-2 全像術之文獻回顧 2
1-3 光學繞射斷層掃描之文獻回顧 3
1-4 研究動機 4
1-5 論文架構 5
第二章實驗理論 6
2-1 全像術 6
2-2 薄全像與厚全像 7
2-3 布拉格條件 9
2-4 耦合波理論 11
2-5 光學繞射斷層掃描框架 18
第三章實驗方法及結果 21
3-1 VHOE製程 21
3-2 VHOE量測架構 23
3-2-1 光學元件的像差影響 24
3-3 折射率分布重建 28
3-4 製程時長對VHOE品質的影響 32
3-4-1 以三維折射率分布進行VOHIL掃描模擬 37
第四章 VHOE繞射光型模擬驗證 40
4-1 相位疊加法 40
4-2 模擬結果 43
4-4 反射式VHOE的折射率分布重建 50
4-4-1 基於VOHIL模擬的反射式VHOE折射率分布重建 56
4-4-2 以反射式模擬探討物鏡收光角度的影響 60
4-4-3 以近眼顯示器參數模擬物鏡NA的選擇 64
第五章結論 69
參考文獻 70
中英文名詞對照表 76

參考文獻

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指導教授

余業緯孫慶成(Yeh-Wei Yu Ching-Cherng SUN)

審核日期

2025-1-22

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