氧化鋅薄膜於超音波聚焦噴墨裝置之設計分析與製作

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姓名

巫宗翰(Tzung-han Wu) 查詢紙本館藏

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機械工程學系

論文名稱

氧化鋅薄膜於超音波聚焦噴墨裝置之設計分析與製作
(Design and Fabrication of Ultrasonic Focusing Printing Device with ZnO Thin Film)

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摘要(中)

超音波聚焦噴墨技術為近幾年研究發展的一種新穎之噴墨機制。不同於熱氣泡式以及壓電式噴墨法，超音波聚焦噴墨法不需噴嘴及加熱即可達到噴墨之效果。本研究旨在製造並且分析超音波聚焦噴墨裝置中之兩個主要元件：菲涅爾透鏡與氧化鋅換能器。研究中我們使用微機電製程之技術製作操作頻率為100 MHz與200 MHz之菲涅爾聚焦透鏡。透過表面輪廓分析儀與掃描式電子顯微鏡之量測，可觀測出所製作之菲涅爾聚焦透鏡具有三階與四階之結構。在換能器方面，我們使用射頻磁控式濺鍍法來沉積氧化鋅薄膜，並製作結構為 Al/ZnO/Pt/Ti/SiO2/Si 之壓電換能器。將所製作之氧化鋅換能器進行X光繞射儀量測以觀察氧化鋅薄膜之晶體結構。並藉由觀測X光繞射圖中之c軸方向以獲得濺鍍時合適之基板溫度。最後，使用安捷倫公司所生產型號為4395A之阻抗分析儀量測厚度分別為15.31、20.9與24.9 μm氧化鋅薄膜之阻抗值，並証實其共振頻率分別為186.5、131.5與112.2 MHz。

摘要(英)

Ultrasonic focusing printing technology is a novel droplet ejection mechanism which has been developed in recent years. Different to the thermal-bubble and piezoelectric printing methods, the ultrasonic focusing printing method ejects droplets required neither nozzle nor heat. The study investigates the fabrication of ultrasonic focusing printing device, especially two main components including Fresnel lens and ZnO transducer. The binary Fresnel lenses with operating frequency at 100 MHz and 200 MHz are fabricated by MEMS technology. The three-level and four-level structural Fresnel lens can be observed by using α-step and SEM. In the aspect of transducer, the ZnO thin films are deposited by RF magnetron sputtering to construct an Al/ZnO/Pt/Ti/SiO2/Si structure piezoelectric transducer. XRD measurement is performed to characterize the crystal structure of ZnO thin films and find suitable substrate temperature for getting well c-axis orientation. The impedance of 15.31, 20.9, and 24.9 μm ZnO transducers are measured by using Agilent 4395A impedance analyzer. It is confirmed that their resonant frequencies of 186.5, 131.5, and 112.2 MHz, respectively.

關鍵字(中)

★ 菲涅爾透鏡
★ 壓電換能器
★ 氧化鋅薄膜
★ 超音波噴墨

關鍵字(英)

★ Fresnel lens
★ Piezoelectric transducer
★ ZnO film
★ Ultrasonic ejector

論文目次

CHAPTER 1 INTRODUCTION 1
1.1 Background 1
1.2 Literature Review 5
1.3 Motivation and Framework 7
CHAPTER 2 THEORETICAL BASIS OF ULTRASONIC INKJET EJECTOR 9
2.1 Piezoelectric Transducer 9
2.1.1 Piezoelectric effect 10
2.1.2 Piezoelectric constitutive equations and constants 12
2.1.3 Analysis of piezoelectric resonant frequency with Mason’s model 14
2.2 Sound and Ultrasound 19
2.2.1 Sound excitation and propagation 20
2.2.2 Physical properties of ultrasound 20
2.3 Ultrasonic Focusing Lens 28
2.3.1 Mechanisms of sound wave convergence 28
2.3.2 Parameters of binary Fresnel lens dimension 34
CHAPTER 3 FABRICATION OF THE ULTRASONIC INKJET EJECTOR 36
3.1 Fabrication of Binary Fresnel Lens 36
3.1.1 Dimension of binary Fresnel lens 36
3.1.2 Fabrication processes of binary Fresnel lens 38
3.2 Fabrication of ZnO Ultrasonic Transducers 46
3.2.1 Crystal structure of ZnO thin films 47
3.2.2 Resonant frequency of ZnO ultrasonic transducers 48
3.2.3 Properties of plasma 51
3.2.4 Instrument of sputtering 53
3.2.5 Fabrication processes of ZnO ultrasonic transducers 56
CHAPTER 4 RESULT AND ANALYSIS OF THE ULTRASONIC INKJET EJECTOR 59
4.1 Result and Analysis of Binary Fresnel Lens Fabrication 59
4.1.1 Surface profile of binary Fresnel lens fabrication 59
4.1.2 SEM images of binary Fresnel lens fabrication 61
4.2 Property Measurements of ZnO Ultrasonic Transducers 64
4.2.1 Crystallization of ZnO thin films 64
4.2.2 Effects of substrate temperature on crystallization of ZnO thin films 65
4.2.3 Impedance measurement of ZnO ultrasonic transducers 69
CHAPTER 5 CONCLUSIONS 72
5.1 Concluding Remarks 72
5.2 Future Works 73
BIBLIOGRAPHY 74

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指導教授

潘敏俊(Min-Chun Pan)

審核日期

2009-7-29

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