本文主要研究台灣半導體產業及其垂直結構上游、中游及下游各個層次之生產力的影響因素。同時，探討上游、中游及下游三方角色上，其研發創新能力除了對廠商本身創造直接效益，是否也能在產業內因研發有垂直外溢效果而受惠，進而提高生產力。 本實證研究對象範圍為半導體產業上市上櫃的公司。研究期間為1998年至2005年。所採用之原始資料皆取自「台灣經濟新報資料庫」(TEJ)。估計方法採用傳統Panel Data估計方法。包括Pooling data、固定效果(fixed effect)及隨機效果(random effect)。並且以Hausman(1978)來檢定出最適合本實證的估計方法。 本文實證結果：1.整個半導體產業而言，薪資及資本對生產力為顯著正相關，研發和外溢效果呈替代關係。2.上游廠商的薪資、資本及研發對生產力為顯著正相關，水平外溢效果為顯著負相關，研發和外溢效果呈替代關係。3.中游廠商的資本、水平外溢及垂直(上游至中游)外溢效果對生產力為顯著正值，研發則呈顯示負相關。4.下游廠商的薪資、資本、研發、及垂直(上游對下游)外溢效果對生產力為顯著正相關，水平外溢效果為顯著負相關，研發和垂直(上游對下游)外溢效果交叉項呈替代關係。 This thesis attempts to explore the impact of R&D on the productivity of upstream, medstream and downstream firms of Taiwan’s semiconductor industry and its vertical structure. Using the data base of Taiwan Economic Journal from the year 1998 to 2005.This thesis adopt panel data estimation methods, including pooling data, the fixed effect and the random effect technique. Hausman test is used to determine the appropriate estimation method in the empirical study. The empirical results are listed as follows. 1.For the industry, salary and capital have a significant positive impact on productivity. R&D and horizontal spillover tend to be substitute. 2.For upstream firms, salary, capital and R&D have a significant positive impact on productivity. Horizontal spillover has a significant negative impact. R&D and horizontal spillover tend to be substitute. 3.For medstream firms, capital, horizontal spillover and vertical spillover (upstream to medstream) have a significant positive impact on productivity. R&D has a significant negative impact. 4.For downstream firms, salary, capital, R&D and vertical spillover (upstream to downstream) have a significant positive impact on productivity. Horizontal spillover has a significant negative impact. R&D and vertical spillover (upstream to downstream) tend to be substitute.
