Analytical solutions of film planarization for periodic features

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题名:	Analytical solutions of film planarization for periodic features
作者:	Wu,PY;Chou,FC;Gong,SC
贡献者:	機械工程研究所
关键词:	ROUGH ROTATING-DISK;THIN LIQUID-FILM;TOPOGRAPHY;SIMULATION;THICKNESS;MODEL;FLOW
日期:	1999
上传时间:	2010-06-29 18:03:04 (UTC+8)
出版者:	中央大學
摘要:	Analytical solutions of film profiles and degree of planarization for periodic features during the spin coating process are presented. This article shows that the degree of planarization is independent of Omega(2) and changes slightly with the dimensionless line spacing alpha for Omega(2)> 300. The governing dimensionless parameter Omega(2) represents the ratio of centrifugal force to surface tension force during spin coating. In the cases of low Omega(2) (Omega(2)< 1), the degree of planarization decreases with increasing alpha for a fixed Omega(2). (C) 1999 American Institute of Physics. [S0021-8979(99)05120-8].
關聯:	JOURNAL OF APPLIED PHYSICS
显示于类别:	[機械工程研究所] 期刊論文

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