Effect of surface manufacturing error of cubic phase mask in wavefront coding system

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/28071

Title:	Effect of surface manufacturing error of cubic phase mask in wavefront coding system
Authors:	Chang,CC;Lee,CC
Contributors:	光電科學研究所
Keywords:	POINT-SPREAD FUNCTION;EXTENDED DEPTH;FIELD
Date:	2009
Issue Date:	2010-06-29 19:41:15 (UTC+8)
Publisher:	中央大學
Abstract:	The degenerated performance of extend depth of field (EDoF) in wavefront coding system which using cubic phase mask is simulated. A periodical rotationally symmetric surface error structure is presented and combined with comparison the similarity of point spread function (PSF). The peak to valley (PV) error of the cubic surface is needed smaller than 15% compare with the sag of the cubic surface for low period error existed. (C) 2009 Optical Society of America
Relation:	OPTICS EXPRESS
Appears in Collections:	[Graduate Institute of Optics and Photonics] journal & Dissertation

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