Effect of surface manufacturing error of cubic phase mask in wavefront coding system

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題名:	Effect of surface manufacturing error of cubic phase mask in wavefront coding system
作者:	Chang,CC;Lee,CC
貢獻者:	光電科學研究所
關鍵詞:	POINT-SPREAD FUNCTION;EXTENDED DEPTH;FIELD
日期:	2009
上傳時間:	2010-06-29 19:41:15 (UTC+8)
出版者:	中央大學
摘要:	The degenerated performance of extend depth of field (EDoF) in wavefront coding system which using cubic phase mask is simulated. A periodical rotationally symmetric surface error structure is presented and combined with comparison the similarity of point spread function (PSF). The peak to valley (PV) error of the cubic surface is needed smaller than 15% compare with the sag of the cubic surface for low period error existed. (C) 2009 Optical Society of America
關聯:	OPTICS EXPRESS
顯示於類別:	[光電科學研究所] 期刊論文

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