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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/30602


    Title: Effect of fluoroalkyl substituents on the reactions of alkylchlorosilanes with mold surfaces for nanoimprint lithography
    Authors: Chen,JK;Ko,FH;Hsieh,KF;Chou,CT;Chang,FC
    Contributors: 化學工程與材料工程研究所
    Keywords: SELF-ASSEMBLED MONOLAYERS;ALKYLSILOXANE MONOLAYERS;IMPRINT LITHOGRAPHY;CONTACT ANGLES;SILICON;DEPOSITION;ALKYLTRICHLOROSILANES;TEMPERATURE;POLYMERS;COATINGS
    Date: 2004
    Issue Date: 2010-07-06 16:23:09 (UTC+8)
    Publisher: 中央大學
    Abstract: We have applied trichloro(3,3,3-trifluoropropyl)silane (FPTS) and trichloro(1H, 1H, 2H, 2H-perfluorooctyl)silane (FOTS) for the preparation of self-assembled film on a silicon mold for use as releasing, antisticking layers for nanoimprint lithography. Fro
    Relation: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    Appears in Collections:[化學工程與材料工程研究所] 期刊論文

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