Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35420

Title:	Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization
Authors:	Pan,EY;Pu,NW;Tong,YP;Yau,HF
Contributors:	光電科學與工程學系
Keywords:	OPTICAL-DATA STORAGE;MICROFABRICATION;POLYMERIZATION;MICROMACHINES;EXCITATION;DRIVEN;LIGHT
Date:	2003
Issue Date:	2010-07-07 14:14:11 (UTC+8)
Publisher:	中央大學
Abstract:	Micro-cell structures with side-walls as thin as 0.70 mum and aspect ratios as high as 6.7 are fabricated by single-layer writing through two-photon-absorption (TPA) photopolymerization. The use of a moderate-numerical-aperture (N.A.) objective lens to ob
Relation:	APPLIED PHYSICS B-LASERS AND OPTICS
Appears in Collections:	[Department of Optics and Photonics] journal & Dissertation

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