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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35421


    Title: Fabry-Perot structures for attenuated phase-shifting mask application in ArF and F-2 lithography
    Authors: Chen,HL;Wu,HS;Lee,CC;Ko,FH;Fan,W;Hsieh,CI
    Contributors: 光電科學與工程學系
    Keywords: 157 NM;ULTRAVIOLET
    Date: 2003
    Issue Date: 2010-07-07 14:14:13 (UTC+8)
    Publisher: 中央大學
    Abstract: We demonstrate a structure for an attenuated phase-shifting mask (APSM) which is based on a three-layer Fabry-Perot structure for ArF (193 nm) and F-2 (157 run) excimer laser based lithographies. The APSM structure is composed of a metal/dielectric/metal
    Relation: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    Appears in Collections:[光電科學與工程學系] 期刊論文

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