English  |  正體中文  |  简体中文  |  Items with full text/Total items : 66984/66984 (100%)
Visitors : 22923056      Online Users : 108
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version


    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35422


    Title: Fabry-Perot type antireflective coatings for binary mask applications in ArF and F-2 excimer laser lithographies
    Authors: Chen,HL;Lee,CC;Chuang,YF;Liu,MC;Hsieh,CI;Ko,FH
    Contributors: 光電科學與工程學系
    Keywords: ELECTRON-BEAM LITHOGRAPHY;NM
    Date: 2003
    Issue Date: 2010-07-07 14:14:16 (UTC+8)
    Publisher: 中央大學
    Abstract: We demonstrated an antireflective coating structure, which is based on a three-layer Fabry-Perot structure, for binary masks of ArF (193 nm) and F-2 (157 nm) excimer laser based lithographies. The antireflective coating structure is composed of a metal/di
    Relation: ELECTROCHEMICAL AND SOLID STATE LETTERS
    Appears in Collections:[光電科學與工程學系] 期刊論文

    Files in This Item:

    File Description SizeFormat
    index.html0KbHTML345View/Open


    All items in NCUIR are protected by copyright, with all rights reserved.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback  - 隱私權政策聲明