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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35492


    Title: CO2-laser-assisted plasma-enhanced chemical vapor deposition of silicon dioxide thin film
    Authors: Tsai,HS;Chiu,HC;Chang,SH;Cheng,CC;Lee,CT;Liu,HP
    Contributors: 光電科學與工程學系
    Date: 2001
    Issue Date: 2010-07-07 14:30:26 (UTC+8)
    Publisher: 中央大學
    Abstract: The plasma enhanced chemical vapor deposition (PECVD) of silicon dioxide (SiO2) thin films from SiH4 and N2O has been executed with and without CO2 laser illumination. The quality of the film processed under a 10.6 mum CO2 laser was close to that of a fil
    Relation: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    Appears in Collections:[光電科學與工程學系] 期刊論文

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