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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35493


    Title: Determination of the mechanical properties of thin films by digital phase shifting interferometry
    Authors: Tien,CL;Lee,CC;Tsai,YL;Sun,WS
    Contributors: 光電科學與工程學系
    Keywords: THERMAL-EXPANSION COEFFICIENT;ION-ASSISTED DEPOSITION;STRESS;SILICON
    Date: 2001
    Issue Date: 2010-07-07 14:30:45 (UTC+8)
    Publisher: 中央大學
    Abstract: A new method for the measurement of internal stress and coefficient of thermal expansion of thin oxide films is presented and investigated experimentally, that combines digital phase shifting interferometry with image-processing technique to improve the a
    Relation: OPTICS COMMUNICATIONS
    Appears in Collections:[光電科學與工程學系] 期刊論文

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