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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35542


    Title: Laser-assisted plasma-enhanced chemical vapor deposition of silicon nitride thin film
    Authors: Tsai,HS;Jaw,GJ;Chang,SH;Cheng,CC;Lee,CT;Liu,HP
    Contributors: 光電科學與工程學系
    Date: 2000
    Issue Date: 2010-07-07 14:35:31 (UTC+8)
    Publisher: 中央大學
    Abstract: Hydrogenated amorphous silicon-nitride (a-Si-N-x:H) films with low hydrogen content were deposited using a CO2 laser-assisted PECVD, or LAPECVD system. This system was based upon a conventional capacitive RF (13.56 MHz) discharge to dissociate both ammoni
    Relation: SURFACE & COATINGS TECHNOLOGY
    Appears in Collections:[光電科學與工程學系] 期刊論文

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