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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35543


    Title: Long-term thermal stability of Ti/Al/Pt/Au Ohmic contacts to n-type GaN
    Authors: Lee,CT;Kao,HW
    Contributors: 光電科學與工程學系
    Keywords: LAYER;FILMS;TI/AL
    Date: 2000
    Issue Date: 2010-07-07 14:35:33 (UTC+8)
    Publisher: 中央大學
    Abstract: We present a study of the long-term thermal stability and low specific contact resistance of Ti/Al/Pt/Au multilayer contacts to n-type GaN. The Ohmic performance can be maintained up to 60 and 540 min for thermal annealing at 950 and 850 degrees C, respec
    Relation: APPLIED PHYSICS LETTERS
    Appears in Collections:[光電科學與工程學系] 期刊論文

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