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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35558


    Title: Simultaneous determination of the thermal expansion coefficient and the elastic modulus of Ta2O5 thin film using phase shifting interferometry
    Authors: Tien,CL;Jaing,CC;Lee,CC;Chuang,KP
    Contributors: 光電科學與工程學系
    Keywords: ION-ASSISTED DEPOSITION;REFRACTIVE-INDEX;DIELECTRIC FILMS;RESIDUAL-STRESS;YOUNGS MODULUS;NITRIDE FILMS;TEMPERATURE;SILICON;COATINGS;SIO2
    Date: 2000
    Issue Date: 2010-07-07 14:36:04 (UTC+8)
    Publisher: 中央大學
    Abstract: This paper reports on the application of a phase shifting interferometry technique for the concurrent measurement of the thermal expansion coefficient alpha(f) and the elastic modulus E-f/1 nu(f) of Ta2O5 thin film. The Ta2O5 films were prepared by ion be
    Relation: JOURNAL OF MODERN OPTICS
    Appears in Collections:[光電科學與工程學系] 期刊論文

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