The measurement of thin film stress using phase shifting interferometry

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35561

Title:	The measurement of thin film stress using phase shifting interferometry
Authors:	Tien,CL;Lee,CC;Jaing,CC
Contributors:	光電科學與工程學系
Keywords:	ION-ASSISTED DEPOSITION;MECHANICAL-STRESS;SIO2;TEMPERATURE
Date:	2000
Issue Date:	2010-07-07 14:36:08 (UTC+8)
Publisher:	中央大學
Abstract:	A new technique for determining the stress of thin films is described. This technique combines digital phase shifting interferometry with image-processing software. A circular disc polished on one side is used as the coated substrate during film depositio
Relation:	JOURNAL OF MODERN OPTICS
Appears in Collections:	[Department of Optics and Photonics] journal & Dissertation

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