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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35676


    Title: Microstructure- and composition-related characteristics of LaF3 thin films at 193 nm
    Authors: Liu,Ming-Chung;Lee,Cheng-Chung;Kaneko,Masaaki;Nakahira,Kazuhide;Takano,Yuuichi
    Contributors: 薄膜技術研究中心
    Keywords: VACUUM ULTRAVIOLET;COATING MATERIALS;OPTICAL COATINGS;FLUORIDE FILMS;MGF2;EVAPORATION;DEPOSITION;BOAT
    Date: 2006
    Issue Date: 2010-07-07 15:47:42 (UTC+8)
    Publisher: 中央大學
    Abstract: The characteristics of lanthanum fluoride (LaF3) thin films deposited with a resistive heating (RH) boat and by e-beam gun evaporation at different substrate temperatures have been studied. The characteristics of the deposited films, including optical pro
    Relation: OPTICAL ENGINEERING
    Appears in Collections:[薄膜技術研究中心] 期刊論文

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