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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/38702

    Title: Ultrathin TiO2 amorphous films for high transmittance APSM blanks at 157 and 193 nm wavelength simultaneously
    Authors: Lai,FD;Chang,CM;Wang,LA;Yih,TS
    Contributors: 物理研究所
    Keywords: SYSTEMS
    Date: 2003
    Issue Date: 2010-07-08 13:35:48 (UTC+8)
    Publisher: 中央大學
    Abstract: Ultrathin TiO2 amorphous films are deposited on ultraviolet grade fused silica substrates and CaF2 by using rf reactive unbalanced magnetron sputtering from a Ti metal target in atmosphere of Ar and O-2. For an O-2/Ar flow rate ratio of more than 1.5, the
    Appears in Collections:[物理研究所] 期刊論文

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