English  |  正體中文  |  简体中文  |  Items with full text/Total items : 66984/66984 (100%)
Visitors : 23080248      Online Users : 619
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version


    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/38702


    Title: Ultrathin TiO2 amorphous films for high transmittance APSM blanks at 157 and 193 nm wavelength simultaneously
    Authors: Lai,FD;Chang,CM;Wang,LA;Yih,TS
    Contributors: 物理研究所
    Keywords: SYSTEMS
    Date: 2003
    Issue Date: 2010-07-08 13:35:48 (UTC+8)
    Publisher: 中央大學
    Abstract: Ultrathin TiO2 amorphous films are deposited on ultraviolet grade fused silica substrates and CaF2 by using rf reactive unbalanced magnetron sputtering from a Ti metal target in atmosphere of Ar and O-2. For an O-2/Ar flow rate ratio of more than 1.5, the
    Relation: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    Appears in Collections:[物理研究所] 期刊論文

    Files in This Item:

    File Description SizeFormat
    index.html0KbHTML254View/Open


    All items in NCUIR are protected by copyright, with all rights reserved.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback  - 隱私權政策聲明