The doping of GaN with Mg diffusion

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/39048

Title:	The doping of GaN with Mg diffusion
Authors:	Pan,CJ;Chi,GC
Contributors:	物理研究所
Keywords:	MOLECULAR-BEAM EPITAXY;P-TYPE GAN;PHOTOLUMINESCENCE
Date:	1999
Issue Date:	2010-07-08 14:03:18 (UTC+8)
Publisher:	中央大學
Abstract:	The characteristics of GaN films diffused with Mg were studied. The undoped GaN films were grown by metalorganic chemical vapor deposition (MOCVD). The photoluminescence (PL) spectra of Mg diffused GaN showed a broad violet emission. The Mg-diffused GaN was p-type conductivity with a mobility of 13 cm(2)/V-s and a hole concentration of 3 x 10(15)/cm(3) at a diffusion temperature of 1100 degrees C. However, the samples, which were diffused at 1100 degrees C, showed a red emission peak after the annealing process. From the diffusion depth profile observed by secondary ion mass spectrometry (SIMS), we obtained the activation energy of 1.3 eV for Mg diffusion in GaN. (C) 1999 Published by Elsevier Science Ltd. All rights reserved.
Relation:	SOLID-STATE ELECTRONICS
Appears in Collections:	[Graduate Institute of Physics] journal & Dissertation

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