研究奈晶矽與非晶矽之多層結構經熱退火處理後之性質及其在PIN太陽能電池吸收層中之應用; Thermal Annealing Treatments on Nanocrystalline and Amorphous Silicon Multilayers and its Applications on the Absorber of PIN Solar Cells

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/43459

Title:	研究奈晶矽與非晶矽之多層結構經熱退火處理後之性質及其在PIN太陽能電池吸收層中之應用;Thermal Annealing Treatments on Nanocrystalline and Amorphous Silicon Multilayers and its Applications on the Absorber of PIN Solar Cells
Authors:	謝志堅;Chih-chien Hsieh
Contributors:	材料科學與工程研究所
Keywords:	晶粒尺寸;結晶率;氫化微晶矽薄膜;微結構比例;氫含量;氫化非晶矽薄膜;電漿增強型化學氣相沈積系統;microstructure fraction;hydrogen content;grain size;crystalline fraction;plasma-enhanced chemical vapor deposition;hydrogenated amorphous silicon;hydrogenated microcrystalline silicon
Date:	2010-08-19
Issue Date:	2010-12-08 13:39:39 (UTC+8)
Publisher:	國立中央大學
Abstract:	研究奈晶矽與非晶矽之多層結構經熱退火處理後之性質及其在PIN太陽能電池吸收層中之應用 Thermal Annealing Treatments on Nanocrystalline and Amorphous Silicon Multilayers and its Applications on the Absorber of PIN Solar Cells
Appears in Collections:	[Institute of Materials Science and Engineering] Electronic Thesis & Dissertation

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