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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/50218

    Title: Effects of bias on properties of Ti-C:H films coated by filtered cathodic vacuum arc
    Authors: Lee,S;Chu,CL;Gwo,J;Huang,JJ;Tsai,MJ;Wang,SM
    Contributors: 機械工程學系
    Date: 2011
    Issue Date: 2012-03-27 17:06:46 (UTC+8)
    Publisher: 國立中央大學
    Abstract: A bias voltage apparatus is attached to the filtered cathode vacuum arc system for coating a diamond-like film containing Ti on WC substrate. Ti, which acts as the cathode target, is sputtered by plasma, and reacts with C(2)H(2) gas, then deposits on the WC under working conditions of 60 A current and voltage between -50 and -275 V. Such processed diamond-like film containing Ti(Ti-C:H) is analysed by glow discharge spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy and nanoindentation for determining Ti concentration, crystallographic structure, bonding mode and mechanical properties. Characteristic parameters are determined to obtain suitable properties, and the underlying reasons are also addressed.
    Appears in Collections:[機械工程學系] 期刊論文

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