Characterizing the wetting of metallic thin films with angle-resolved photoelectron spectroscopy

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/52724

Title:	Characterizing the wetting of metallic thin films with angle-resolved photoelectron spectroscopy
Authors:	Luh,DA;Liu,KC;Cheng,CM;Tsuei,KD
Contributors:	物理學系
Keywords:	QUANTUM-WELL STATES;SURFACE-STATE;AG/CU(111);CU(111);AG
Date:	2010
Issue Date:	2012-06-11 10:41:44 (UTC+8)
Publisher:	國立中央大學
Abstract:	The wetting of thin Ag films on Cu (111) is characterized in detail with angle-resolved photoelectron spectroscopy. After constructing disordered Ag films on Cu (111), we monitored the evolution of their layer-resolved Shockley states during wetting. Our results provide the first observation of a transitional state, which implies a coexistence of clean Cu (111), 1 ML of Ag on Cu (111), and 2 ML of Ag on Cu (111). The evolution of these Shockley states indicates a two-process model of wetting.
Relation:	PHYSICAL REVIEW B
Appears in Collections:	[Department of Physics] journal & Dissertation

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