Characterizing the wetting of metallic thin films with angle-resolved photoelectron spectroscopy

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题名:	Characterizing the wetting of metallic thin films with angle-resolved photoelectron spectroscopy
作者:	Luh,DA;Liu,KC;Cheng,CM;Tsuei,KD
贡献者:	物理學系
关键词:	QUANTUM-WELL STATES;SURFACE-STATE;AG/CU(111);CU(111);AG
日期:	2010
上传时间:	2012-06-11 10:41:44 (UTC+8)
出版者:	國立中央大學
摘要:	The wetting of thin Ag films on Cu (111) is characterized in detail with angle-resolved photoelectron spectroscopy. After constructing disordered Ag films on Cu (111), we monitored the evolution of their layer-resolved Shockley states during wetting. Our results provide the first observation of a transitional state, which implies a coexistence of clean Cu (111), 1 ML of Ag on Cu (111), and 2 ML of Ag on Cu (111). The evolution of these Shockley states indicates a two-process model of wetting.
關聯:	PHYSICAL REVIEW B
显示于类别:	[物理學系] 期刊論文

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