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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/64587

    Title: 一種應用於投影式曝光機的大口徑投影光學系統
    Authors: 林楷傑;Lin,Kai-jie
    Contributors: 光機電工程研究所
    Keywords: 投影式曝光機
    Date: 2014-05-29
    Issue Date: 2014-08-11 19:04:35 (UTC+8)
    Publisher: 國立中央大學
    Abstract: 本論文主要是提供一種設計技術,此技術可應用於投影式曝光機的投影光學系統設
    計,此投影光學系統使用之透鏡,口徑約為直徑30cm 左右,曝光光罩為長條形,可針對
    統全域光場MTF≧0.6 為標準,設計結果之最小曝光線寬為7μm左右。另外微調倍率範圍
    蒙地卡羅分析之公差擾動範圍為3 個標準差,曝光最小線寬10μm。分析時以ISO10110
    和ISO10110 相比較為嚴苛,但分析結果可提供給設計者在選擇設計方法時,相對客觀的

    This thesis is to provide a design technology that can be applied to the optical system
    design for the projection-type exposure machine, in which the shape of exposure mask is a long
    strip. It can be used for the scanning exposure of the photo-resist board with a large scan area.
    The projection magnification of the exposure mask can be fine-tuned to compensate for the
    thermal expansion of the substrate under light exposing.
    There are three different ways to be used for the preliminary design, They are described as
    the following, Type1: using the parameters from the related patent; Type2: system parameters
    being calculated by the aberration formula from journal articles; Type3: system parameters
    being calculated by the theory of paraxial optics.
    By comparing the simulated results of the three design methods, it is found that the optical
    specification such as the effective focal length, aberrations, and the ability of projection
    magnification fine-tuning were very close among them. Thus, it justified the applicability of the
    design method proposed in this thesis. In the case of not considering manufacturing tolerance,
    and with MTF≧0.6 as the standard, the minimum line width of our design was about 7μm. In
    addition, the range of projection magnification fine-tuning was up to 0.1%, the distortion
    <0.001%, and the uniformity of exposing energy was greater than 90%.
    Finally, the tolerance analysis of this design was conducted under the following
    preconditions: the yield value being more than 90% (MTF≧0.6), the range of perturbations for
    the Monte Carlo analysis being 3 times the standard deviation, and the minimum line width was
    10μm. The basis of our tolerance analysis was the international ISO10110 standard. The
    research of this thesis was focusing on the process of designing techniques. Although the
    tolerances in this study were more stringent as compared to the ISO10110, the proposed design
    technology was still a valuable choice for the optical system of the projection-type exposure
    Appears in Collections:[光機電工程研究所 ] 博碩士論文

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