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|Issue Date: ||2014-08-11 19:04:35 (UTC+8)|
This thesis is to provide a design technology that can be applied to the optical system
design for the projection-type exposure machine, in which the shape of exposure mask is a long
strip. It can be used for the scanning exposure of the photo-resist board with a large scan area.
The projection magnification of the exposure mask can be fine-tuned to compensate for the
thermal expansion of the substrate under light exposing.
There are three different ways to be used for the preliminary design, They are described as
the following, Type1: using the parameters from the related patent; Type2: system parameters
being calculated by the aberration formula from journal articles; Type3: system parameters
being calculated by the theory of paraxial optics.
By comparing the simulated results of the three design methods, it is found that the optical
specification such as the effective focal length, aberrations, and the ability of projection
magnification fine-tuning were very close among them. Thus, it justified the applicability of the
design method proposed in this thesis. In the case of not considering manufacturing tolerance,
and with MTF≧0.6 as the standard, the minimum line width of our design was about 7μm. In
addition, the range of projection magnification fine-tuning was up to 0.1%, the distortion
<0.001%, and the uniformity of exposing energy was greater than 90%.
Finally, the tolerance analysis of this design was conducted under the following
preconditions: the yield value being more than 90% (MTF≧0.6), the range of perturbations for
the Monte Carlo analysis being 3 times the standard deviation, and the minimum line width was
10μm. The basis of our tolerance analysis was the international ISO10110 standard. The
research of this thesis was focusing on the process of designing techniques. Although the
tolerances in this study were more stringent as compared to the ISO10110, the proposed design
technology was still a valuable choice for the optical system of the projection-type exposure
|Appears in Collections:||[光機電工程研究所 ] 博碩士論文|
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