English  |  正體中文  |  简体中文  |  Items with full text/Total items : 74010/74010 (100%)
Visitors : 24674468      Online Users : 366
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version

    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/72361

    Title: 矽晶圓濕式去光阻技術的過去發展與現況
    Authors: 劉錡;Liu,Chi
    Contributors: 機械工程學系
    Keywords: 微影製程;濕式清洗製程;超音波輔助清洗;photolithography;wet cleaning;ultrasonic
    Date: 2016-07-01
    Issue Date: 2016-10-13 14:50:15 (UTC+8)
    Publisher: 國立中央大學
    Abstract: 從1965年至今,摩爾定律預言的準確度已經持續了超過半個世紀,預計將持續到2020年,關鍵在於微影製程(lithography)技術,而微影製程後的光阻或汙染物清洗也非常重要,但清洗完成後需要大量的超純水清洗,因此會產生大量的有機廢液,這些廢液會汙染環境且對人體健康有害。
    ;From 1965 to now, Moore′s Law has been continued for more than half a century. It estimate that can continue to 2020. The key point is in the lithography process. After the lithography process, the photoresist and others contamination removing is also very important. But the wafers need lots of DI water to rinse them. It makes lots of organic waste liquid, it will pollute the environment and harmful to human health.
    As the length scale of semiconductor devices advances to nanometer range, via structures and high aspect ratio, the effective penetration of aqueous will be more arduous. The other hand, the environmental awareness rise. New technology has been invented to replace traditional cleaning process since 1990.
    Supercritical carbon dioxide and DIO3 stripping process have been invented. The formulation of organic solvent were also improved for the wafer substrate material. These washing techniques can also work with ultrasonic assistance, it could increase photoresist and other contaminants removal efficiency.
    Appears in Collections:[機械工程研究所] 博碩士論文

    Files in This Item:

    File Description SizeFormat

    All items in NCUIR are protected by copyright, with all rights reserved.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 隱私權政策聲明