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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/7381


    Title: 非晶矽繞射光學元件的製作與分析;Fabrication and Analysis of Amorphous Silicon Diffractive Optical Elements
    Authors: 陳建勳;Chien-Hsun Chen
    Contributors: 物理研究所
    Keywords: 繞射光學元件;非晶矽;Amorphous silicon;DOEs
    Date: 2005-06-24
    Issue Date: 2009-09-22 10:56:55 (UTC+8)
    Publisher: 國立中央大學圖書館
    Abstract: 本實驗主要目的為以電漿輔助化學氣相沉積系統(Plasma Enhanced Chemical Vapor Deposition : PECVD)在石英基板上成長平坦的非晶矽薄膜,並進一步以平坦的非晶矽薄膜製作高繞射效率二階相位Fresnel lens。 在實驗中,改變電漿輔助化學氣相沉積系統的SiH4氣體流量、腔體工作壓力、RF power大小,成功沉積出表面粗度小於3nm的非晶矽薄膜。 製作非晶矽薄膜二階相位Fresnel lens時,我們以G-solver軟體模擬及理論計算,求出當以入射光波長633nm,元件所需厚度,以期達到高繞射效率。再利用微影製程及蝕刻技術,製作出二階相位Fresnel lens,當厚度為320nm,有最高繞射效率可達32%,與模擬值34%相當接近。
    Appears in Collections:[Graduate Institute of Physics] Electronic Thesis & Dissertation

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