English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 80990/80990 (100%)
造訪人次 : 41635133      線上人數 : 2241
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜尋範圍 查詢小技巧:
  • 您可在西文檢索詞彙前後加上"雙引號",以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋,建議至進階搜尋限定作者欄位,可獲得較完整資料
  • 進階搜尋


    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/80340


    題名: 奈米球微影術結合電化學沉積法製備規則有序陽極氧化鋁奈米模板及一維銅金屬奈米結構陣列之研究;Fabrication of ordered anodic aluminum oxide nanotemplate and one dimensional Cu metal nanostructure arrays by nanosphere lithography combined with electrochemical deposition
    作者: 陳柏瑜;Chen, Bo-Yu
    貢獻者: 化學工程與材料工程學系
    關鍵詞: 陽極氧化鋁;銅金屬奈米結構;奈米球微影術
    日期: 2019-08-19
    上傳時間: 2019-09-03 12:34:08 (UTC+8)
    出版者: 國立中央大學
    摘要: 陽極氧化鋁由於其具備準直孔洞通道結構,可應用於過濾、抗反射塗層和奈米結構材料的模板等領域,近年來受到廣泛的研究。目前已有多種製造薄型陽極氧化鋁膜之技術被開發出來,例如:PMMA模板輔助法、離子束光刻法以及模板奈米壓印法等。然而這些製備之步驟繁瑣耗時長、無法製備大面積模板及製備成本昂貴,使得在實際應用上受到很大的限制。為克服相關製程限制,本研究首度利用單層奈米球陣列微影技術,藉由調控奈米球的直徑和陽極氧化蝕刻條件,成功地製備出孔徑和間距可調變之規則有序薄型陽極氧化鋁奈米模板。此外,銅金屬奈米線與奈米管,因其結構具有高準直性與高表面積之優點,被廣泛應用於光電元件、場發射、觸媒催化、水解產氫等領域上,然而如何精準控制所製備一維銅奈米結構之尺寸、形貌、排列週期性等,一直是急需克服的挑戰。因此,本研究也利用上述製程所製備之規則氧化鋁奈米模板進一步結合電化學沉積製程,可在具有導電性的各式基材上製備出一系列準直有序排列且內外徑可調變之一維銅金屬奈米線與奈米管陣列。而此所開發之新穎製程技術,相信將可應用於製備其他各式一維金屬或半導體奈米結構陣列。另外由於銅金屬奈米管的有序排列、高深寬比、中空狀結構等,具有極低啟動電場的優異電子場發射特性。實驗結果呈現出令人興奮的前景,這裡所提出的新方法將提供在製備一維銅金屬奈米管陣列結構基電子場發射源有序陣列的能力。;The anodic aluminum oxide (AAO) have been widely used as templates in nanotechnology. Due to their characteristic continuous, highly ordered pore structures, they have been utilized extensively in the fabrication of nanomaterials leading to various applications, such as separating, antireflection coating, and a template for synthesis of various nanostructures. To fabricate thin AAO templates with well-ordered nanopore arrays, a variety of patterning techniques have been developed. However, the low processing speed, high-cost, and operational complexity make them challenging to use. In this study, we propose a high throughput and low-cost nanopatterning approach to fabricate thin AAO templates, which is based on the nanosphere lithography with one-step anodization process. The pore diameter and inter-pore spacing can be readily controlled by adjusting the diameter of the nanospheres and the anodic etching conditions. In addition, copper metal nanowires and nanotubes are widely used in optoelectronic devices, field emission, catalyst catalysis and hydrogen evolution reaction due to their well-ordered and high surface area. However, how to accurately control the size, shape and periodicity of the prepared one-dimensional copper nanostructure has been a challenge. Herein we report a novel way to fabricate high filling, large-area, and uniform copper metal nanowires and nanotubes arrays by nanosphere lithography combined with electrochemical deposition technology. In addition, the copper metal nanotubes owing to their well-ordered arrangement, high aspect ratio, and hollow structure, exhibit excellent field-emission properties with a very low turn-on field. The obtained results present the exciting prospect that the new approach proposed here will provide the capability to fabricate well-ordered arrays of copper metal nanotubes-based field emitters.
    顯示於類別:[化學工程與材料工程研究所] 博碩士論文

    文件中的檔案:

    檔案 描述 大小格式瀏覽次數
    index.html0KbHTML220檢視/開啟


    在NCUIR中所有的資料項目都受到原著作權保護.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 隱私權政策聲明