中大機構典藏-NCU Institutional Repository-提供博碩士論文、考古題、期刊論文、研究計畫等下載:Item 987654321/85952
English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 80990/80990 (100%)
造訪人次 : 40889951      線上人數 : 1106
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜尋範圍 查詢小技巧:
  • 您可在西文檢索詞彙前後加上"雙引號",以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋,建議至進階搜尋限定作者欄位,可獲得較完整資料
  • 進階搜尋


    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/85952


    題名: 用於深紫外發光二極體的氮化硼生長;Growth of boron nitride for deep ultraviolet light-emitting Diodes
    作者: 彭書彧;Peng-Shu-Yu
    貢獻者: 光電科學與工程學系
    關鍵詞: 氮化硼
    日期: 2021-07-26
    上傳時間: 2021-12-07 11:45:56 (UTC+8)
    出版者: 國立中央大學
    摘要: 近年來,深紫外(deep ultraviolet, DUV, 波長 ? 290 nm)發光二極體 (light-emitting diodes,
    LEDs) 的外部量子效率很難突破 20%,遠低於可見光 LED 的水準,主要原因在於:深紫外
    LED 的 P 型磊晶層必須同時具備高穿透率、高導電性,而這是一般 DUV LED 常用材料—氮
    化鋁鎵(AlGaN)所不具備的特性。然而 hBN (hexagonal Boron Nitride)是近年來熱門的三五
    族氮化物材料,其兼具高能帶、低電洞活化能的特性,能使深紫外光波段的光不被吸收,
    亦能大幅提升電洞濃度,增加導電性,是深紫外 LED 所需的理想 P 型材料。此外,氮化硼
    的能帶高達 6 eV,接近氮化鋁 (AlN) 的 6.1 eV,能阻擋電子離開量子井,增加 DUV LED 的
    內部量子效率。文獻顯示,氮化硼的電洞活化能最低可達 30 meV,遠低於 AlN 的 510 meV,
    能提供大量電洞進入量子井,提升電洞電子對在量子井的複合數量,增強 DUV LED 的發光
    效率,也能降低操作電壓,減少熱能生成,有助於提升元件的使用壽命。上述的優點,使
    氮化硼成為目前 DUV LED 非常熱門的 P 型材料;Despite years of research efforts, the external quantum efficiency of deep ultraviolet (DUV,
    wavelength ? 290 nm) LEDs rarely exceed 20%, far below the level of visible LEDs. The main
    reason is that the p-type contact layer of DUV LEDs must simultaneously fulfill the requirement of
    high transparent and high conductive, which is extremely difficult to achieve with the commonly
    used material, AlGaN. To address the issue, hexagonal boron nitride (hBN) is recently regarded as a
    potential alternative to AlGaN. hBN has the characteristics of high energy band and low hole
    activation energy, which can prevent light absorption and provide sufficient free hole concentration
    in the p-type layer. Because of the two merits, hBN is an ideal p-type material for DUV LEDs. In
    addition, the wide bandgap (6 eV) of hBN can form a large band offset with AlGaN, effectively
    blocking the electron spill from quantum wells. The hole activation energy of boron nitride is
    reported to be as low as 30 meV, which is much lower than the ~510 meV of AlN. With such small
    activation energy, hBN can provide a large number of holes to enter the quantum well, enhancing
    the quantum efficiency of DUV LEDs. The low hole activation energy can also lower the operating
    voltage, reduce heat generation, and thus improve device lifetime. The above-mentioned advantages
    make boron nitride a promising p-type material for DUV LEDs.
    顯示於類別:[光電科學研究所] 博碩士論文

    文件中的檔案:

    檔案 描述 大小格式瀏覽次數
    index.html0KbHTML83檢視/開啟


    在NCUIR中所有的資料項目都受到原著作權保護.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 隱私權政策聲明