Kinetic modeling of the NF3 decomposition via dielectric barrier discharges in N-2/NF3 mixtures

NCUIR > Engineering College > Graduate Institute of Environmental Engineering > journal & Dissertation > Item 987654321/30085

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/30085

Title:	Kinetic modeling of the NF3 decomposition via dielectric barrier discharges in N-2/NF3 mixtures
Authors:	Chen,Hsin Liang;Lee,How Ming;Chang,Moo Been
Contributors:	環境工程研究所
Keywords:	NONTHERMAL PLASMA REACTOR;N-2(A (3)SIGMA(+)(U));CHEMICAL-KINETICS;RATE CONSTANTS;FREE-RADICALS;GROUND-STATE;REMOVAL;GAS;RECOMBINATION;ABATEMENT
Date:	2006
Issue Date:	2010-07-06 16:10:52 (UTC+8)
Publisher:	中央大學
Abstract:	Emission of PFCs (perfluorocompound) has attracted much attention in recent years due to its relatively high contribution to the global warming. Non-thermal plasma is one of the most promising technologies to effectively control the PFC emissions. In this
Relation:	PLASMA PROCESSES AND POLYMERS
Appears in Collections:	[Graduate Institute of Environmental Engineering ] journal & Dissertation

Files in This Item:

File	Description	Size	Format
index.html		0Kb	HTML	321	View/Open

社群 sharing