Enhanced Secondary Electron Emission Yield of MgO Thin Films by Vapor Chopping Technique for Plasma Display Panels

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题名:	Enhanced Secondary Electron Emission Yield of MgO Thin Films by Vapor Chopping Technique for Plasma Display Panels
作者:	Tamboli,SH;Singh,CB;Patil,RB;Puri,V;Puri,RK;Singh,V;Luo,MF
贡献者:	物理學系
关键词:	OPTICAL-PROPERTIES;DEPOSITION;ADHESION;EROSION
日期:	2011
上传时间:	2012-06-11 10:48:48 (UTC+8)
出版者:	國立中央大學
摘要:	We report the enhanced secondary electron emission yield and reduced firing voltage of ac-PDPs by using vapour chopped MgO thin film as protective layer. MgO thin films have been prepared by thermal oxidation (in air) of vacuum evaporated magnesium films at 573, 623 and 673 K. SEE yield showed variation with oxidation temperature. The use of vapour chopping technique approach was aimed to improve the SEE yield. The reduced surface roughness and improved SEE yield by use of vapour chopping technique supports the better performance and greater lifetime of the panel assisting to reduce the operational costs.
關聯:	JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS
显示于类别:	[物理學系] 期刊論文

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