Enhanced Secondary Electron Emission Yield of MgO Thin Films by Vapor Chopping Technique for Plasma Display Panels

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題名:	Enhanced Secondary Electron Emission Yield of MgO Thin Films by Vapor Chopping Technique for Plasma Display Panels
作者:	Tamboli,SH;Singh,CB;Patil,RB;Puri,V;Puri,RK;Singh,V;Luo,MF
貢獻者:	物理學系
關鍵詞:	OPTICAL-PROPERTIES;DEPOSITION;ADHESION;EROSION
日期:	2011
上傳時間:	2012-06-11 10:48:48 (UTC+8)
出版者:	國立中央大學
摘要:	We report the enhanced secondary electron emission yield and reduced firing voltage of ac-PDPs by using vapour chopped MgO thin film as protective layer. MgO thin films have been prepared by thermal oxidation (in air) of vacuum evaporated magnesium films at 573, 623 and 673 K. SEE yield showed variation with oxidation temperature. The use of vapour chopping technique approach was aimed to improve the SEE yield. The reduced surface roughness and improved SEE yield by use of vapour chopping technique supports the better performance and greater lifetime of the panel assisting to reduce the operational costs.
關聯:	JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS
顯示於類別:	[物理學系] 期刊論文

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