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    請使用永久網址來引用或連結此文件: https://ir.lib.ncu.edu.tw/handle/987654321/101459


    題名: Study of p-type AlN-doped SnO 2 thin films and its transparent devices
    作者: 劉正毓;Wu, Y.J.;Liu, Y.S.;Hsieh, C.Y.;Lee, P.M.;Wei, Y.S.;Liao, C.H.;Liu, C.Y.
    貢獻者: 工學院化學工程與材料工程學系
    關鍵詞: Aluminum;Annealing;Conduction heating;Outgassing;p-Type;SnO2;Thin film;Thin films;Tin dioxide;Tin oxides;Volt-ampere characteristics;X-ray photoelectron spectroscopy;XPS
    日期: 2015-02-15
    上傳時間: 2026-04-21 14:34:26 (UTC+8)
    出版者: Elsevier;Elsevier B.V
    摘要: 摘要: •A p-type AlN-doped SnO2/n-type fluorine-doped SnO2 junction was fabricated.•The I–V curve of this SnO2 junction exhibited clear p–n junction characteristics and low turn-on voltage.•The p-type AlN-doped SnO2/n-type fluorine-doped SnO2 junction has excellent transmittance in the visible region.•The formation of the SnNAl bond improved the stability of the N ions in the AlN-doped SnO2 thin films. The electrical properties of transparent Al-doped tin oxide (SnO2), N-doped SnO2, and AlN-doped SnO2 thin films were studied. The Al-doped tin oxide (SnO2) thin films all show n-type conduction regardless the annealing condition. The n-type conduction of the as-deposited N-doped SnO2, and AlN-doped SnO2 thin films could be converted to p-type conduction by annealing the films at an elevated temperature of 450°C. XPS analysis verified that the substitution of N ions in the O ion sites in the annealed N-doped SnO2 and AlN-doped SnO2 thin films were responsible for the n–p conduction transition. The conduction of the annealed N-doped SnO2 and AlN-doped SnO2 thin films could be converted back to n-type conduction by thermally annealing the films at higher temperature, over 450°C. The p–n conduction transition is related with the outgassing of N ions in the p-type N-doped SnO2 and AlN-doped SnO2 thin films. Remarkably, we found that the Al content can retard the outgassing of N ions in the p-type N-doped SnO2 and AlN-doped SnO2 thin films and prolong the p–n conduction transition temperature above 600°C. XPS analysis revealed that the formation of the SnNAl bond improved the stability of the N ions in the AlN-doped SnO2 thin films. I–V curve of the p-type AlN-doped SnO2/n-type fluorine-doped SnO2 junction exhibited clear p–n junction characteristics, a low leakage current under the revised bias (1.13×10−5A at −5V), and a low turn-on voltage (3.24V). p-Type AlN-doped SnO2/n-type fluorine-doped SnO2 junction exhibited excellent transmittance (over 90%) in the visible region (470–750nm).
    出版者: Elsevier B.V
    出版日期: 2015-02-15
    出處: Applied surface science, 2015-02, Vol.328, p.262-268
    版權: 2014 Elsevier B.V.
    識別號: ISSN: 0169-4332
    識別號: DOI: 10.1016/j.apsusc.2014.12.028
    顯示於類別:[化學工程與材料工程學系 ] 期刊論文

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