 |
English
|
正體中文
|
简体中文
|
全文筆數/總筆數 : 94274/94274 (100%)
造訪人次 : 82906890
線上人數 : 2443
|
|
|
資料載入中.....
|
請使用永久網址來引用或連結此文件:
https://ir.lib.ncu.edu.tw/handle/987654321/102546
|
| 題名: | Experimental determination of electron affinities for InN and gan polar surfaces |
| 作者: | 林世昌;Lin, Shih-Chieh;Kuo, Cheng-Tai;Liu, Xiaoge;Liang, Li-Yen;Cheng, Ching-Hung;Lin, Chung-Huang;Tang, Shu-Jung;Chang, Lo-Yueh;Chen, Chia-Hao;Gwo, Shangjr |
| 貢獻者: | 生醫理工學院生命科學系 |
| 日期: | 2012-03-01 |
| 上傳時間: | 2026-04-23 11:12:40 (UTC+8) |
| 出版者: | Japan Society of Applied Physics;The Japan Society of Applied Physics |
| 摘要: | 摘要: We have measured the electron affinities of clean, stoichiometric InN and GaN polar surfaces via ultraviolet photoelectron spectroscopy. The electron affinities of InN were measured to be 4.7 and 4.6 eV for In- and N-polar surfaces, respectively. In contrast, the electron affinities of GaN vary greatly with the film polarity, i.e., 3.8 and 3.3 eV for Ga- and N-polar surfaces, respectively. We propose that the difference between polar surfaces originates from the spontaneous polarization effect. Furthermore, it's closely related to the film carrier concentration. With the measured electron affinities, we are able to confirm the known polar heterojunction band alignments. 出版者: The Japan Society of Applied Physics 出版日期: 2012-03-01 出處: Applied physics express, 2012-03, Vol.5 (3), p.031003-031003-3 資源來源: Institute of Physics Journals 識別號: ISSN: 1882-0778 識別號: EISSN: 1882-0786 識別號: DOI: 10.1143/APEX.5.031003 |
| 顯示於類別: | [生命科學系] 期刊論文
|
文件中的檔案:
| 檔案 |
描述 |
大小 | 格式 | 瀏覽次數 |
| index.html | | 0Kb | HTML | 31 | 檢視/開啟 |
|
在NCUIR中所有的資料項目都受到原著作權保護.
|
::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::