Antireflection with graphene oxide

Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/103100

Title:	Antireflection with graphene oxide
Authors:	王智明;Chen, Liang-Chun;Yu, Chun-Tien;Peng, Yu-Chang;Hung, Jing-Jie;Chang, Hung-Ming;Tzeng, Shien-Der;Wang, Chih-Ming;Lin, Chun-Chieh;Lin, Chu-Hsuan
Contributors:	理學院光電科學與工程學系
Keywords:	Antireflection coatings;Etching;Graphene;Honeycomb;Masks;Oxides;Refractive index;Refractivity
Date:	2016-01-01
Issue Date:	2026-04-23 11:23:19 (UTC+8)
Publisher:	The Optical Society
Abstract:	摘要： Graphene oxide (GO) obtained by chemical exfoliation exhibits a quasi-2D structure. Its refractive index is very close to the theoretically predicted best refractive index for a single antireflection coating layer between air and Si. The robust honeycomb plane structure of GO makes it a promising mask candidate for surface texturizing. Here, we demonstrate different GO distributions on Si, and report the reflection properties before and after etching. For an etched Si substrate with suitable GO coating, the reflectance reached 2.1% at 667 nm. Preliminary 1.5-min-long etching of a p super(+) nn super(+) solar cell with a GO mask boosted the efficiency from 7.09% to 7.55%. 出版日期： 2016-01-01 出處： Optical materials express, 2016-01, Vol.6 (1), p.8-18 資源來源： Optica Publishing Group Journals 識別號： ISSN: 2159-3930 識別號： EISSN: 2159-3930 識別號： DOI: 10.1364/OME.6.000008
Appears in Collections:	[Department of Optics and Photonics] journal & Dissertation

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