Antireflection with graphene oxide

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題名:	Antireflection with graphene oxide
作者:	王智明;Chen, Liang-Chun;Yu, Chun-Tien;Peng, Yu-Chang;Hung, Jing-Jie;Chang, Hung-Ming;Tzeng, Shien-Der;Wang, Chih-Ming;Lin, Chun-Chieh;Lin, Chu-Hsuan
貢獻者:	理學院光電科學與工程學系
關鍵詞:	Antireflection coatings;Etching;Graphene;Honeycomb;Masks;Oxides;Refractive index;Refractivity
日期:	2016-01-01
上傳時間:	2026-04-23 11:23:19 (UTC+8)
出版者:	The Optical Society
摘要:	摘要： Graphene oxide (GO) obtained by chemical exfoliation exhibits a quasi-2D structure. Its refractive index is very close to the theoretically predicted best refractive index for a single antireflection coating layer between air and Si. The robust honeycomb plane structure of GO makes it a promising mask candidate for surface texturizing. Here, we demonstrate different GO distributions on Si, and report the reflection properties before and after etching. For an etched Si substrate with suitable GO coating, the reflectance reached 2.1% at 667 nm. Preliminary 1.5-min-long etching of a p super(+) nn super(+) solar cell with a GO mask boosted the efficiency from 7.09% to 7.55%. 出版日期： 2016-01-01 出處： Optical materials express, 2016-01, Vol.6 (1), p.8-18 資源來源： Optica Publishing Group Journals 識別號： ISSN: 2159-3930 識別號： EISSN: 2159-3930 識別號： DOI: 10.1364/OME.6.000008
顯示於類別:	[光電科學與工程學系] 期刊論文

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