FTO films deposited in transition and oxide modes by magnetron sputtering using tin metal target

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題名:	FTO films deposited in transition and oxide modes by magnetron sputtering using tin metal target
作者:	陳昇暉;Liao, Bo-Huei;Chan, Shih-Hao;Lee, Cheng-Chung;Kuo, Chien-Cheng;Chen, Sheng-Hui;Chiang, Donyau
貢獻者:	理學院光電科學與工程學系
關鍵詞:	Deposition;Electrical properties;Electrical resistivity;Magnetron sputtering;Optical properties;Oxides;Tin;Transmittance
日期:	2014-02-01
上傳時間:	2026-04-23 11:30:40 (UTC+8)
出版者:	The Optical Society;United States
摘要:	摘要： Fluorine-doped tin oxide (FTO) films were prepared by pulsed DC magnetron sputtering with a metal Sn target. Two different modes were applied to deposit the FTO films, and their respective optical and electrical properties were evaluated. In the transition mode, the minimum resistivity of the FTO film was 1.63×10(-3) Ω cm with average transmittance of 80.0% in the visible region. Furthermore, FTO films deposited in the oxide mode and mixed simultaneously with H2 could achieve even lower resistivity to 8.42×10(-4) Ω cm and higher average transmittance up to 81.1% in the visible region. 其他題名： Appl Opt 出版者： United States 出版日期： 2014-02-01 出處： Applied optics (2004), 2014-02, Vol.53 (4), p.A148-A153 資源來源： Optica Publishing Group Journals 識別號： ISSN: 1559-128X 識別號： EISSN: 2155-3165 識別號： EISSN: 1539-4522 識別號： DOI: 10.1364/AO.53.00A148 識別號： PMID: 24514207
顯示於類別:	[光電科學與工程學系] 期刊論文

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