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Item 987654321/103668
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https://ir.lib.ncu.edu.tw/handle/987654321/103668
題名:
Fabrication of si heterojunction solar cells using pdoped sinanocrystals embedded in SiNx films as emitters
作者:
陳一塵
;
Wu, Ping-Jung
;
Wang, Yu-Cian
;
Chen, I-Chen
貢獻者:
工學院材料科學與工程研究所
關鍵詞:
Chemistry and Materials Science
;
Materials Science
;
Molecular Medicine
;
Nano Express
;
Nanochemistry
;
Nanoscale Science and Technology
;
Nanotechnology
;
Nanotechnology and Microengineering
日期:
2013-01-01
上傳時間:
2026-04-23 11:34:59 (UTC+8)
出版者:
Springer New York;New York: Springer New York
摘要:
摘要: Si heterojunction solar cells were fabricated on p-type single-crystal Si (sc-Si) substrates using phosphorus-doped Si nanocrystals (Si-NCs) embedded in SiN x (Si-NCs/SiN x ) films as emitters. The Si-NCs were formed by post-annealing of silicon-rich silicon nitride films deposited by electron cyclotron resonance chemical vapor deposition. We investigate the influence of the N/Si ratio in the Si-NCs/SiN x films on their electrical and optical properties, as well as the photovoltaic properties of the fabricated heterojunction devices. Increasing the nitrogen content enhances the optical gap E 04 while deteriorating the electrical conductivity of the Si-NCs/SiN x film, leading to an increased short-circuit current density and a decreased fill factor of the heterojunction device. These trends could be interpreted by a bi-phase model which describes the Si-NCs/SiN x film as a mixture of a high-transparency SiN x phase and a low-resistivity Si-NC phase. A preliminary efficiency of 8.6% is achieved for the Si-NCs/sc-Si heterojunction solar cell.
其他題名: Nanoscale Res Lett
出版者: New York: Springer New York
出版日期: 2013-11-05
出處: Nanoscale research letters, 2013-11, Vol.8 (1), p.457-457
資源來源: Publicly available content database
版權: Wu et al.; licensee Springer. 2013. This article is published under license to BioMed Central Ltd. This is an open access article distributed under the terms of the Creative Commons Attribution License ( ), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
版權: Copyright © 2013 Wu et al.; licensee Springer. 2013 Wu et al.; licensee Springer.
識別號: ISSN: 1931-7573
識別號: EISSN: 1556-276X
識別號: DOI: 10.1186/1556-276X-8-457
識別號: PMID: 24188725
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[材料科學與工程研究所 ] 期刊論文
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