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    請使用永久網址來引用或連結此文件: https://ir.lib.ncu.edu.tw/handle/987654321/103668


    題名: Fabrication of si heterojunction solar cells using pdoped sinanocrystals embedded in SiNx films as emitters
    作者: 陳一塵;Wu, Ping-Jung;Wang, Yu-Cian;Chen, I-Chen
    貢獻者: 工學院材料科學與工程研究所
    關鍵詞: Chemistry and Materials Science;Materials Science;Molecular Medicine;Nano Express;Nanochemistry;Nanoscale Science and Technology;Nanotechnology;Nanotechnology and Microengineering
    日期: 2013-01-01
    上傳時間: 2026-04-23 11:34:59 (UTC+8)
    出版者: Springer New York;New York: Springer New York
    摘要: 摘要: Si heterojunction solar cells were fabricated on p-type single-crystal Si (sc-Si) substrates using phosphorus-doped Si nanocrystals (Si-NCs) embedded in SiN x (Si-NCs/SiN x ) films as emitters. The Si-NCs were formed by post-annealing of silicon-rich silicon nitride films deposited by electron cyclotron resonance chemical vapor deposition. We investigate the influence of the N/Si ratio in the Si-NCs/SiN x films on their electrical and optical properties, as well as the photovoltaic properties of the fabricated heterojunction devices. Increasing the nitrogen content enhances the optical gap E 04 while deteriorating the electrical conductivity of the Si-NCs/SiN x film, leading to an increased short-circuit current density and a decreased fill factor of the heterojunction device. These trends could be interpreted by a bi-phase model which describes the Si-NCs/SiN x film as a mixture of a high-transparency SiN x phase and a low-resistivity Si-NC phase. A preliminary efficiency of 8.6% is achieved for the Si-NCs/sc-Si heterojunction solar cell.
    其他題名: Nanoscale Res Lett
    出版者: New York: Springer New York
    出版日期: 2013-11-05
    出處: Nanoscale research letters, 2013-11, Vol.8 (1), p.457-457
    資源來源: Publicly available content database
    版權: Wu et al.; licensee Springer. 2013. This article is published under license to BioMed Central Ltd. This is an open access article distributed under the terms of the Creative Commons Attribution License ( ), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
    版權: Copyright © 2013 Wu et al.; licensee Springer. 2013 Wu et al.; licensee Springer.
    識別號: ISSN: 1931-7573
    識別號: EISSN: 1556-276X
    識別號: DOI: 10.1186/1556-276X-8-457
    識別號: PMID: 24188725
    顯示於類別:[材料科學與工程研究所 ] 期刊論文

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