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    請使用永久網址來引用或連結此文件: https://ir.lib.ncu.edu.tw/handle/987654321/104329


    題名: The structure and photoelectrochemistry of Al, Ti Co-doped zinc oxide thin films prepared by sol-gel dip-coating process
    作者: 林景崎;Huang, Mao-Chia;Wang, Tsing-Hai;Cheng, Shuo-Han;Lin, Jing-Chie;Lan, Wei-Hsuan;Wu, Ching-Chen;Chang, Wen-Sheng
    貢獻者: 工學院材料科學與工程研究所
    關鍵詞: Aluminum;Atzo;Density;Dip coatings;Ethyl alcohol;Photoelectrochemistry;Sol gel process;Thin films;Titanium;Water Splitting;Zinc oxide;ZNO
    日期: 2014-03-01
    上傳時間: 2026-04-23 11:48:09 (UTC+8)
    出版者: American Scientific Publishers
    摘要: 摘要: Al, Ti co-doped ZnO (ATZO) thin films were prepared on glass substrate via sol-gel dip-coating process. Importantly, we replaced the toxic 2-methoxy-ethanol by nontoxic ethanol as a much safer reagent. The dip-coating was repeated four times and as-obtained thin films were then annealed at 500 °C for 1 h in air. We found that introducing Al and Ti dopant would transfer the principal diffraction peak from (101) to (002), decrease the vibration strength of E2 high and E1 LO, lead a relative smoother surface, blueshift the band gap, decrease resistance and increase photocurrent density. Also, doping Al and Ti arose the open circuit potential and as a result, increased the anti-correction of ATZO films.
    其他題名: Nanosci Nanotechnol Lett
    出版者: American Scientific Publishers
    出版日期: 2014-03-01
    出處: Nanoscience and nanotechnology letters, 2014-03, Vol.6 (3), p.210-215
    識別號: ISSN: 1941-4900
    識別號: EISSN: 1941-4919
    識別號: DOI: 10.1166/nnl.2014.1754
    顯示於類別:[材料科學與工程研究所 ] 期刊論文

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