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    NCU Institutional Repository > 理學院 > 物理學系 > 期刊論文 >  Item 987654321/104550


    請使用永久網址來引用或連結此文件: https://ir.lib.ncu.edu.tw/handle/987654321/104550


    題名: Effect of surface steps on the diffusion of adsorbates investigated with angle-resolved photoelectron spectroscopy
    作者: 陸大安;Luh, Dah-An;Chen, Chi-Lu;Liang, Xihui;Cheng, Cheng-Maw;Tsuei, Ku-Ding
    貢獻者: 理學院物理學系
    關鍵詞: Adsorbates;Annealing;Condensed matter;Diffusion;Diffusion barriers;Photoelectron spectroscopy;Potential barriers;Thin films
    日期: 2012-07-16
    上傳時間: 2026-04-23 11:52:18 (UTC+8)
    出版者: American Physical Society
    摘要: 摘要: To investigate the surface diffusion of chemisorbed H on Ag/Au(111) thin films with surface steps, we characterized the distribution of H atoms on the surface by measuring the Shockley states of these surfaces with angle-resolved photoelectron spectroscopy. Our results show that H atoms tend to diffuse and to remain on the terrace at the lower side of the surface steps during annealing. This diffusive behavior is explained qualitatively through the existence of an Ehrlich-Schwoebel potential barrier associated with the surface steps.
    出版日期: 2012-07-16
    出處: Physical review. B, Condensed matter and materials physics, 2012-07, Vol.86 (4), Article 045424
    識別號: ISSN: 1098-0121
    識別號: EISSN: 1550-235X
    識別號: DOI: 10.1103/PhysRevB.86.045424
    顯示於類別:[物理學系] 期刊論文

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