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    NCU Institutional Repository > 理學院 > 物理學系 > 期刊論文 >  Item 987654321/105484


    請使用永久網址來引用或連結此文件: https://ir.lib.ncu.edu.tw/handle/987654321/105484


    題名: Nanoscale Electron Bunching in Laser-Triggered Ionization Injection in Plasma Accelerators
    作者: 白植豪;Xu, X. L.;Pai, C.-H.;Zhang, C. J.;Li, F.;Wan, Y.;Wu, Y. P.;Hua, J. F.;Lu, W.;An, W.;Yu, P.;Joshi, C.;Mori, W. B.
    貢獻者: 理學院物理學系
    關鍵詞: Acceleration;Beams (radiation);Electron beams;Ionization;Nanostructure;Trapping;Wakes;Wavelengths
    日期: 2016-07-15
    上傳時間: 2026-04-23 12:30:54 (UTC+8)
    出版者: American Physical Society;United States: American Physical Society (APS)
    摘要: 摘要: Ionization injection is attractive as a controllable injection scheme for generating high quality electron beams using plasma-based wakefield acceleration. Because of the phase-dependent tunneling ionization rate and the trapping dynamics within a nonlinear wake, the discrete injection of electrons within the wake is nonlinearly mapped to a discrete final phase space structure of the beam at the location where the electrons are trapped. This phenomenon is theoretically analyzed and examined by three-dimensional particle-in-cell simulations which show that three-dimensional effects limit the wave number of the modulation to between >2k_{0} and about 5k_{0}, where k_{0} is the wave number of the injection laser. Such a nanoscale bunched beam can be diagnosed by and used to generate coherent transition radiation and may find use in generating high-power ultraviolet radiation upon passage through a resonant undulator.
    其他題名: Phys Rev Lett
    出版者: United States: American Physical Society (APS)
    出版日期: 2016-07-15
    出處: Physical Review Letters, 2016-07, Vol.117 (3), p.034801-034801, Article 034801
    資源來源: American Physical Society Journals
    識別號: ISSN: 0031-9007
    識別號: EISSN: 1079-7114
    識別號: DOI: 10.1103/physrevlett.117.034801
    識別號: PMID: 27472116
    顯示於類別:[物理學系] 期刊論文

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