Effects of metal layer morphology to silicon nanostructure formation in metal-assisted etching

NCUIR > Engineering College > Departmant of Mechanical Engineering > journal & Dissertation > Item 987654321/108737

Please use this identifier to cite or link to this item: https://ir.lib.ncu.edu.tw/handle/987654321/108737

Title:	Effects of metal layer morphology to silicon nanostructure formation in metal-assisted etching
Authors:	曹嘉文;Tsao, Chia-Wen;Chang, Chia-Pin
Contributors:	工學院機械工程學系
Keywords:	Bioengineering;Biomedical Engineering;Condensed Matter Physics;Etching;General Chemistry;General Materials Science;Gold;Morphology;Nanocomposites;Nanomaterials;Nanostructure;Silicon;Silver
Date:	2012-07-03
Issue Date:	2026-04-23 15:04:00 (UTC+8)
Publisher:	American Scientific Publishers;26650 The Old Road, Suite 208, Valencia, California 91381-0751, USA: American Scientific Publishers
Abstract:	摘要： This study presents a rapid and simple approach for creating silicon nanostructures using metal-assisted etching. The thickness of the metal layer was found to be a key process parameter affecting the surface morphology of silicon nanostructures. Au and Ag layers with a thickness of 3 nm, 5 nm, and 10 nm were used to study the effects of metal catalyst thickness on silicon nanostructure morphology. The experimental results show that the surface morphology of metal has a significant influence on the silicon nanostructure morphology, such that the silicon nanostructures transform from porous silicon surfaces into filament nanostructures or silicon nanowire with increasing thicknesses of both the Au and Ag metal layers. 其他題名： J Nanosci Nanotechnol 出版者： 26650 The Old Road, Suite 208, Valencia, California 91381-0751, USA: American Scientific Publishers 出版日期： 2012-03-01 出處： Journal of Nanoscience and Nanotechnology, 2012-03, Vol.12 (3), p.2742-2749 識別號： ISSN: 1533-4880 識別號： DOI: 10.1166/jnn.2012.5734 識別號： PMID: 22755117
Appears in Collections:	[Departmant of Mechanical Engineering ] journal & Dissertation

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