Effects of metal layer morphology to silicon nanostructure formation in metal-assisted etching

NCU Institutional Repository > 工學院 > 機械工程學系 > 期刊論文 > Item 987654321/108737

jsp.display-item.identifier=請使用永久網址來引用或連結此文件: https://ir.lib.ncu.edu.tw/handle/987654321/108737

题名:	Effects of metal layer morphology to silicon nanostructure formation in metal-assisted etching
作者:	曹嘉文;Tsao, Chia-Wen;Chang, Chia-Pin
贡献者:	工學院機械工程學系
关键词:	Bioengineering;Biomedical Engineering;Condensed Matter Physics;Etching;General Chemistry;General Materials Science;Gold;Morphology;Nanocomposites;Nanomaterials;Nanostructure;Silicon;Silver
日期:	2012-07-03
上传时间:	2026-04-23 15:04:00 (UTC+8)
出版者:	American Scientific Publishers;26650 The Old Road, Suite 208, Valencia, California 91381-0751, USA: American Scientific Publishers
摘要:	摘要： This study presents a rapid and simple approach for creating silicon nanostructures using metal-assisted etching. The thickness of the metal layer was found to be a key process parameter affecting the surface morphology of silicon nanostructures. Au and Ag layers with a thickness of 3 nm, 5 nm, and 10 nm were used to study the effects of metal catalyst thickness on silicon nanostructure morphology. The experimental results show that the surface morphology of metal has a significant influence on the silicon nanostructure morphology, such that the silicon nanostructures transform from porous silicon surfaces into filament nanostructures or silicon nanowire with increasing thicknesses of both the Au and Ag metal layers. 其他題名： J Nanosci Nanotechnol 出版者： 26650 The Old Road, Suite 208, Valencia, California 91381-0751, USA: American Scientific Publishers 出版日期： 2012-03-01 出處： Journal of Nanoscience and Nanotechnology, 2012-03, Vol.12 (3), p.2742-2749 識別號： ISSN: 1533-4880 識別號： DOI: 10.1166/jnn.2012.5734 識別號： PMID: 22755117
显示于类别:	[機械工程學系] 期刊論文

文件中的档案:

档案	描述	大小	格式	浏览次数
index.html		0Kb	HTML	22	检视/开启

在NCUIR中所有的数据项都受到原著作权保护.

社群 sharing

数据加载中.....