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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/29785


    Title: Large-area Co-silicide nanodot arrays produced by colloidal nanosphere lithography and thermal annealing
    Authors: Cheng,S. L.;Wong,S. L.;Lu,S. W.;Chen,H.
    Contributors: 材料科學與工程研究所
    Keywords: THIN-FILMS;FABRICATION;COSI2;GROWTH;NANOSTRUCTURES;NANOPARTICLE
    Date: 2008
    Issue Date: 2010-07-06 15:57:55 (UTC+8)
    Publisher: 中央大學
    Abstract: We report here the Successful fabrication of large-area size-tunable periodic arrays of cobalt and Co-silicide nanodots on silicon Substrates by employing the colloidal nanosphere lithography (NSL) technique and heat treatments. The growth of low-resistiv
    Relation: ULTRAMICROSCOPY???
    Appears in Collections:[Institute of Materials Science and Engineering] journal & Dissertation

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