Abatement of sulfur hexafluoride emissions from the semiconductor manufacturing process by atmospheric pressure plasmas

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Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/30116

Title:	Abatement of sulfur hexafluoride emissions from the semiconductor manufacturing process by atmospheric pressure plasmas
Authors:	Lee,HM;Chang,MB;Wu,KY
Contributors:	環境工程研究所
Keywords:	DIELECTRIC BARRIER DISCHARGES;ION-MOLECULE REACTIONS;GAS-PHASE REACTIONS;RATE CONSTANTS;CHEMICAL-KINETICS;OZONE SYNTHESIS;H-ATOMS;SF6;ELECTRON;REMOVAL
Date:	2004
Issue Date:	2010-07-06 16:12:02 (UTC+8)
Publisher:	中央大學
Abstract:	Sulfur hexafluoride (SF6) is an important gas for plasma etching processes in the semiconductor industry. SF6 intensely absorbs infrared radiation and, consequently, aggravates global warming. This study investigates SF6 abatement by nonthermal plasma tec
Relation:	JOURNAL OF THE AIR & WASTE MANAGEMENT ASSOCIATION
Appears in Collections:	[Graduate Institute of Environmental Engineering ] journal & Dissertation

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