鋁摻雜氧化鋅近紅外窄帶通濾光片之研究;Research on the Aluminum-doped-zinc-oxide Near-infrared Narrow-bandpass Filters

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題名:	鋁摻雜氧化鋅近紅外窄帶通濾光片之研究;Research on the Aluminum-doped-zinc-oxide Near-infrared Narrow-bandpass Filters
作者:	張香允;Chang, Hsiang-Yun
貢獻者:	光電科學與工程學系
關鍵詞:	高功率脈衝磁控濺鍍;鋁摻雜氧化鋅;窄帶通濾光片;近紅外光;HiPIMS;AZO;NBPF;NIR
日期:	2024-07-30
上傳時間:	2024-10-09 15:40:41 (UTC+8)
出版者:	國立中央大學
摘要:	近紅外光波段(Near-IR)由於其在大氣中有高穿透性，且部分特定波段在自然環境中太陽輻射背景值極低，與可見光相比可以提供更可靠的測量結果，因此在車載、LiDAR、通訊、生醫等多方面的感測器需求量日漸增加，而在元件微型化的情形下，現有成熟薄膜材料所製作的近紅外光多層膜膜層過厚不易與矽基感測器整合，因此需要開發新的高低折射率材料來完成近紅外光波段的光學應用。而本研究利用鋁摻雜氧化鋅作為低折射率材料，確認該材料特性及實際應用至1310 nm處之窄帶通濾光片。本實驗使用HiPIMS高功率脈衝磁控濺鍍進行。第一部分為確認鋁摻雜量之影響，透過調變濺鍍靶材上的鋁摻雜濃度、氧氣通量以及快速熱退火溫度，確認AZO的吸收現象，判斷適合應用於1310 nm處的摻雜比例及後續訂製混合靶材的比例。第二部分為調整混合靶材的製程參數，並透過氧氣通量、Duty Cycle、快速熱退火等，優化薄膜結構來獲取最佳光學特性之薄膜。第三部分則為SiH高折射率材料的最優化，透過調變氫氣通量、快速熱退火取得折射率較高、吸收最低且穩定之薄膜。最後第四部分則為設計及鍍製多層膜樣品，結合上述章節的結果，以不同參數AZO薄膜，實際堆疊穿透窗於1310 nm處的窄帶通濾光片樣品，並探討其優劣變化，並同樣進行快速熱退火處理觀察其退火後變化。 ;Near-infrared (Near-IR) wavelengths are increasingly in demand for sensors across various domains, such as automotive, LiDAR, communications, and biomedical applications. This is due to their high transparent in the atmosphere and the presence of specific bands with extremely low solar background radiation, which provide reliable measurements that visible light cannot discern. However, with the miniaturization of devices, the existing thin-film materials used for fabricating multilayer near-IR filter become too thick to be integrated with Si-based sensors easily. Therefore, to develop new high and low refractive index materials to fulfill optical applications in the Near-IR wavelength range is necessary. This study has utilized aluminum-doped zinc oxide (AZO) as a low refractive index material, confirming its characteristics and practical application in narrowband pass filters at 1310 nm. High Power Impulse Magnetron Sputtering (HiPIMS) has been applied in this experiment. The first part of this research focuses on determining the impact of aluminum doping. By adjusting the doping of aluminum on the sputtering target, oxygen flow, and rapid thermal annealing (RTA) temperature, the absorption phenomenon of AZO is confirmed. The appropriate doping ratio for application at 1310 nm is determined, followed by customizing the proportion of the mixed target. The second part involves optimizing the process parameters of the mixed target. By adjusting the oxygen flow, duty cycle, and RTA, the film structure is optimized to achieve the most suitable optical properties. The third part involves optimizing the high refractive index SiH. By adjusting the hydrogen flow and RTA, a film with higher refractive index, lower absorption, and greater stability is obtained. The final part involves designing and depositing multilayer film samples. Combining the results from the previous sections, different parameter AZO films are stacked to produce narrowband pass filter samples at 1310 nm. The performance variations are explored, and the effects of RTA are observed.
顯示於類別:	[光電科學研究所] 博碩士論文

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