奈米壓印製作環形共振腔之研究;Fabrication of Ring Resonators Using Nanoimprint Lithography

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/95039

Title:	奈米壓印製作環形共振腔之研究;Fabrication of Ring Resonators Using Nanoimprint Lithography
Authors:	鄭賀元;Zheng, He-Yuan
Contributors:	光電科學與工程學系
Keywords:	奈米壓印;微環形共振腔
Date:	2024-08-20
Issue Date:	2024-10-09 15:44:51 (UTC+8)
Publisher:	國立中央大學
Abstract:	近年來，光子集成電路（PICs）在光通信、生物和化學感測、微波合成器和非線性光子學等領域展現出巨大潛力。利用成熟的互補金屬氧化物半導體（CMOS）技術，PICs 提供了緊湊、集成和可以擴展的製造方法。波導共振腔在這些技術中起關鍵作用，提供感測、調制和濾波功能。早期，電子束微影（EBL）因其高解析度成為製造高品質共振腔的主要技術，但耗時且昂貴，不適合大規模製造。為了克服這一問題，接觸式、深紫外（DUV）和 I-line步進式微影被提出，雖然成本降低，但仍需無塵室設施，且解析度也因此受到影響。最近，奈米壓印微影（NIL）提供了一個簡單、低成本且高通量的製造方法。NIL利用精細模具壓印到基板上，製造了金屬透鏡、電子器件和等離子體組件。基於聚合物的波導共振腔的品質因子高達105，展示了大規模生產低損耗奈米元件的潛力。然而，先前的研究主要集中在聚合物波導，少數研究探討了介電材料波導在 PIC 應用中的潛力，但未展現光學功能。在本篇論文中，我們使用NIL製造了具有高品質因子的Si3N4波導共振腔。本論文研究得出了一些新發現。首先，我們通過NIL在Si3N4薄膜上製造了品質因子高達1.5×105且消光比約為16 dB的高品質波導共振腔。相比於之前的低損耗Si3N4光子波導，波導共振腔顯示出實現集成光學功能（如調制器和濾波器）的潛力。其次，結合熱壓印和紫外（UV）奈米壓印技術來製造模具和壓印波導共振腔元件，提供了更好的壓印質量和NIL 製造靈活性。通過適當設計波導幾何結構，展示的脊形波導在正常色散範圍內提供約-35 ps/nm/km的低波導色散。最後，通過微加熱器展示了腔體共振的可調性。這項工作展示了NIL在PIC應用中的潛力。;In recent years, photonic integrated circuits (PICs) have shown significant potential in fields such as optical communications, biological and chemical sensing, microwave synthesizers, and nonlinear photonics. Leveraging mature complementary metal-oxide semiconductor (CMOS) technology, PICs offer a compact, integrated, and scalable manufacturing approach. Waveguide resonators play a crucial role in these technologies, providing functionalities like sensing, modulation, and filtering. Early on, electron beam lithography (EBL) was the primary technique for manufacturing high-quality resonators due to its high resolution. However, it was time consuming and expensive, making it unsuitable for large-scale production. To overcome this, contact, deep ultraviolet (DUV), and I-line stepper lithography were introduced, reducing costs but still requiring cleanroom facilities, which affected resolution. More recently, nanoimprint lithography (NIL) has emerged as a simple, low-cost, and high-throughput manufacturing method. NIL involves pressing fine molds onto substrates to create components such as metal lenses, electronic devices, and plasmonic structures. Polymer-based waveguide resonators have achieved quality factors as high as 105, demonstrating the potential for large-scale production of low-loss nanoscale devices. However, previous research has predominantly focused on polymer waveguides, with limited exploration of dielectric material waveguides in PIC applications without demonstrating optical functionalities. In this paper, we used NIL to manufacture high quality factor Si3N4 waveguide resonators. Our study has yielded several novel findings: Firstly, using NIL, we fabricated Si3N4 waveguide resonators on thin films with quality factors reaching up to 1.5×105 and extinction ratios approximately 16 dB. Compared to previous low-loss Si3N4 photonics waveguides, these resonators show potential for integrating optical functionalities such as modulators and filters. iii Secondly, by combining thermal imprinting and ultraviolet (UV) nanoimprint technology for mold fabrication and imprinting waveguide resonator components, we improved imprint quality and the flexibility of NIL manufacturing. Thirdly, by designing appropriate waveguide geometries, ridge waveguides demonstrated low waveguide dispersion of approximately -35 ps/nm/km within normal dispersion ranges. Lastly, we demonstrated tunability of cavity resonances through microheaters. This work underscores the potential of NIL in PIC applications, highlighting advancements in Si3N4 waveguide resonators and their integration into optical functionalities.
Appears in Collections:	[Graduate Institute of Optics and Photonics] Electronic Thesis & Dissertation

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