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    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/26910


    題名: Analytical solutions of film planarization for periodic features
    作者: Wu,PY;Chou,FC;Gong,SC
    貢獻者: 機械工程研究所
    關鍵詞: ROUGH ROTATING-DISK;THIN LIQUID-FILM;TOPOGRAPHY;SIMULATION;THICKNESS;MODEL;FLOW
    日期: 1999
    上傳時間: 2010-06-29 18:03:04 (UTC+8)
    出版者: 中央大學
    摘要: Analytical solutions of film profiles and degree of planarization for periodic features during the spin coating process are presented. This article shows that the degree of planarization is independent of Omega(2) and changes slightly with the dimensionless line spacing alpha for Omega(2)> 300. The governing dimensionless parameter Omega(2) represents the ratio of centrifugal force to surface tension force during spin coating. In the cases of low Omega(2) (Omega(2)< 1), the degree of planarization decreases with increasing alpha for a fixed Omega(2). (C) 1999 American Institute of Physics. [S0021-8979(99)05120-8].
    關聯: JOURNAL OF APPLIED PHYSICS
    顯示於類別:[機械工程研究所] 期刊論文

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