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    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/29418


    題名: HIGH-TEMPERATURE PERFORMANCE OF GAINP AND ALINP HEMTS WITH WSIX GATES
    作者: CHAN,YJ;KUO,JM
    貢獻者: 電機工程研究所
    關鍵詞: TRANSISTORS;MOCVD
    日期: 1994
    上傳時間: 2010-06-29 20:24:17 (UTC+8)
    出版者: 中央大學
    摘要: Both GaInP/In0.2Ga0.8As and AlInP/In0.2Ga0.8As HEMT's were fabricated with WSix gates and evaluated at high temperature operations. Based on the high stability of WSix gates, both devices functioned at temperature up to 300 degrees C. GaInP HEMT's showed a g(m) reduction from 176 mS/mm at 25 degrees C to 97 mS/mm at 300-degrees C, while V-th shifted from -1.44 V to -3.31 V. AlInP HEMT's also showed a g(m) decrease from 135 mS/mm at 25 degrees C to 70 mS/mm at 300 degrees C, while V-th shifted from -0.4 V to -0.84 V. Both of these devices with WSix gates offer a potential applications to high power and high temperature operations.
    關聯: GALLIUM ARSENIDE AND RELATED COMPOUNDS 1993
    顯示於類別:[電機工程研究所] 期刊論文

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