中大機構典藏-NCU Institutional Repository-提供博碩士論文、考古題、期刊論文、研究計畫等下載:Item 987654321/95711
English  |  正體中文  |  简体中文  |  全文笔数/总笔数 : 80990/80990 (100%)
造访人次 : 42587113      在线人数 : 1111
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜寻范围 查询小技巧:
  • 您可在西文检索词汇前后加上"双引号",以获取较精准的检索结果
  • 若欲以作者姓名搜寻,建议至进阶搜寻限定作者字段,可获得较完整数据
  • 进阶搜寻


    jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/95711


    题名: 用於 50 Gbit/sec 被動式光纖網路的超高速 累增崩潰光電二極體之開發;The Development of Ultrafast Avalanche Photodiode for 50G PON
    作者: 吳燁昆;Wu, Yen-Kun
    贡献者: 電機工程學系
    关键词: 被動式光纖網路;累增崩潰光電二極體
    日期: 2024-07-25
    上传时间: 2024-10-09 17:11:21 (UTC+8)
    出版者: 國立中央大學
    摘要: 在過去的 20 年裡,高速雪崩光電二極體(APDs)在以太網被動
    式光纖網絡(EPON)和 10 G-EPON 的發展中扮演了至關重要的角色。
    商業化的基於 In0.52Al0.48As 的 10 G APDs 通常能夠提供比其 p-i-n
    光電二極體(PDs)對應產品高出 8 dB 的靈敏度。然而,在下一代 50
    G-PON 中,APDs 在中等增益操作(約 10)下所展示的 3-dB 帶寬不
    足以滿足 50 G 操作的頻寬要求(>30 GHz),這使得 50 G APD 接收
    器的靈敏度提升並不明顯。已有研究表明,可以通過使用複雜的均衡
    器積體電路(ICs)和高功率 PD 與半導體光放大器(SOA)進行混合
    或單晶積體化整合來改善接收端的靈敏度。然而,這些額外的 ICs 和
    預放大的SOAs需要大電流偏壓,導致接收端的總功率消耗顯著增加。
    此外,SOAs 中的額外放大自發輻射(ASE)雜訊可能導致接收端靈
    敏度的改善非常有限。
    在高速雪崩光電二極體(APD)中,減薄倍增(M)層是提高其增
    益帶寬積(GBP)和降低過量雜訊的有效方法。然而,這種縮減通常
    伴隨著一些問題,例如由於非常薄的累增層(<100 nm)導致的直接
    v
    隧道效應引起的巨大漏電流(>1 μA),以及由於空乏層厚度減少而導
    致的 RC 限制頻寬下降。
    在本篇論文中,我們展示了一種p極面朝上蝕刻平台結構的APD,
    其中在薄(<50nm)且疊接式的 In0.52Al0.48As 累增層下方埋有厚的
    InP 集極層,可以從根本上降低暗電流、RC 限制頻寬、累增增益和雪
    崩延遲時間之間的權衡。應用這種先進的元件結構,我們探討了具有
    不同累增層厚度(<50 nm)的 APD 性能。而此元件的主動窗口(平台)
    其直徑為 10(20)μm,其優化後的累增層元件在 1.55 μm 波長的激
    發下,於偏壓為 0.9Vb 時有著低暗電流(~0.4 μA)和高響應度(2.8 A/W;
    增益=9.3)的表現。
    此外,該元件表現出優異的動態性能,包括在 0.84 A/W 時的寬光
    電頻寬(44 GHz)、極大的 GBP(1.03 THz)和高飽和電流(12 mA),
    這對應於在 45 GHz 時較大的毫米波(MMW)輸出功率(~0 dBm)。
    我們的增益頻寬積表現甚至超越最近所發表的 Si-Ge APD。
    優異的速度性能結合寬動態範圍和簡單的頂部收光結構,為進一
    步提高 50 G 的被動式光纖網絡(PON)的靈敏度開闢了新可能。;Over the last 20 years, high-speed avalanche photodiodes (APDs) have
    played a vital role in the development of the Ethernet Passive Optical
    Network (EPON) and 10 G-EPON. The commercially available
    In0.52Al0.48As based 10 G APDs can usually provide an 8 dB higher
    sensitivity than that of their p-i-n photodiode (PDs) counterparts. However,
    in the next generation of 50 G-PON, the 3-dB bandwidth demonstrated by
    APDs under moderate gain operation (~10) is insufficient to meet the
    bandwidth requirements for 50 G operation (> 30 GHz), with less
    pronounced benefits for the sensitivity of 50 G APD based receivers .
    It has been demonstrated that the sensitivity at the receiver-end can be
    improved by the incorporation of complex equalizer integrated circuits
    (ICs) and high-power PDs, which are hybrid or monolithic integrated with
    the semiconductor optical amplifier (SOA).
    However, both the additional ICs and pre-amplified SOAs need large
    extra bias currents which leads to a significant increase of overall power
    consumption in the receiver-end. Moreover, the additional amplified
    spontaneous emission (ASE) noise in the SOAs may result in marginal
    improvement in sensitivity in the receiver-end.

    ii
    The thinning of the multiplication (M) layers in high-speed avalanche
    photodiodes (APDs) is an effective way to boost up its gain-bandwidth
    product (GBP) and reduce excess noise. However, such downscaling
    usually comes with a price, a huge leakage current (> 1 μA) induced by
    direct tunneling through the ultimate thin M-layer (< 100 nm) and
    degradation of the RC-limited bandwidth due to the decrease in depletion
    layer thickness.
    In this work, we demonstrate how a p-side up top-illuminated APD
    structure with a thick InP collector layer buried below the thin and cascaded
    In0.52Al0.48As based multiplication layer can fundamentally relax the tradeoffs among the dark current, RC-limited bandwidth, multiplication gain,
    and avalanche delay time. Applying this advanced device structure, we
    then explore the performance of APDs with different thin M-layer
    thicknesses (< 50 nm). Under1.55 μm wavelength excitation, a device
    fabricated with a large active window (mesa) diameter of 10 (20) μm and
    an optimized M-layer thickness exhibits a dark current as low as ~0.4 μA
    and a high responsivity (2.8 A/W; gain=9.3) at 0.9 Vbr.
    Moreover, this device exhibits excellent dynamic performance,
    including a wide optical-to-electrical bandwidth (44 GHz at 0.84 A/W), an
    extremely large GBP of 1.03 THz, and a high saturation current (12 mA),
    which corresponds to a large millimeter-wave (MMW) output power (~0
    dBm) at 45 GHz.
    iii
    The excellent speed performance coupled with the wide dynamic
    range and simple top-illuminated structure opens up new possibilities to
    further enhance the sensitivity of 50 G passive optical networks (PONs).
    显示于类别:[電機工程研究所] 博碩士論文

    文件中的档案:

    档案 描述 大小格式浏览次数
    index.html0KbHTML28检视/开启


    在NCUIR中所有的数据项都受到原著作权保护.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 隱私權政策聲明