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    顯示項目59101-59125 / 83955. (共3359頁)
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    日期題名作者
    2019-03-29 晶圓圖群集隨機特徵加速運算核心;Acceleration Core for the Calculation of the Randomness Features of Wafer Maps 黃昱凱; Huang, Yu-Kai
    2018-06-01 晶圓封裝廠之流程改善研究-以A公司為例;Process optimization of Wafer Level Package–A Case Study on One Company 張雅菁; Ching, Chang Ya
    2012-07-24 晶圓廠Interbay自動化物料搬運系統中自動倉儲(Stocker)內的晶舟盒選取之研究;A Study on the Selection of Cassettes for the Automated Material Handling System in a Wafer Fab 鄭哲昀; Cheng,Che-yun
    2006-01-13 晶圓廠Intrabay內多載量AGV之負載揀取法則與載取派車法則的搭配和優先晶舟的考量 王緯俊; Woei-Jun Wang
    2006-07-05 晶圓廠內設施規劃之研究; A Study For Semiconductor Fab Facility Layout 林世涵; Shih-Han Lin
    2005-06-30 晶圓廠製造執行系統之流程建構與分析; Process Modeling and Analysis for the Manufacturing Execution System of Foundry Fab 黃盛豪; Seng-Hao Huang
    2020-06-01 晶圓測試廠之提升整體設備效率方法研究-以A公司為例 詹益宏; Chan, Yi-Hung
    2021-08-17 晶圓瑕疵數預測與等效瑕疵效率值分析;Wafer Defect Number Prediction and Equivalent Defect Efficiency Analysis 呂忠霖; Lu, Zhong-Lin
    2023-03-08 晶圓研磨漿料中微米級粒子分散劑之開發( I );The Development of Novel Dispersant for Micron-Size Abrasives in Wafer Polishing( I ) 曹恆光
    2024-01-26 晶圓研磨漿料中微米級粒子分散劑之開發( I );The Development of Novel Dispersant for Micron-Size Abrasives in Wafer Polishing( I ) 曹恆光
    2024-01-26 晶圓研磨漿料中微米級粒子分散劑之開發( II );The Development of Novel Dispersant for Micron-Size Abrasives in Wafer Polishing( II ) 曹恆光
    2021-12-21 晶圓簽署:在晶圓圖分析中,一個可解釋良率、隨機性和顯著性的自動報告系統;Wm-Signature: an Auto-Report System to Interpret the Yield, Randomness and Salience for Wafer Map Analysis 陳竹一; 梁新聰
    2015-07-06 晶圓級封裝晶粒檢測自動化研究 -以X公司最終檢驗站為研究對象 蕭毓則; Hsiao,Yu-tse
    2016-08-02 晶圓級封裝重佈線路製程光阻殘留之研究;The Research of Photoresist Residue of Wafer Level Chip Scale Package Redistribution Layer Process 劉振坤; Liu,Chen-Kun
    2026-01-22 晶圓級超穎光學: 從設計、製造、到量測方法;Wafer Level Meta-Optics: from Design, Fabrication, to Characterization. 王智明
    2024-09-27 晶圓級超穎光學: 從設計、製造、到量測方法;Wafer Level Meta-Optics: from Design, Fabrication, to Characterization. 王智明
    2015-07-27 晶圓表面處理製程作業區勞工職業暴露與健康風險評估;Labor Occupational Exposure and Health Risk Assessment of Wafer Surface Process 林家麟; LIN,JIA-LIN
    2009-01-09 晶圓製造廠之設施規劃方法探討及實例驗證-以A公司為研究對象; A Study and Demonstration of Facility Layout Methodology for A Company in Wafer Fabrication Factories. 林晏璋; Yen-chang Lin
    2008-06-27 晶圓製造良率模式之評比與分析-以國內某DRAM廠為例; An Evaluation and Analysis of Yield Model in Wafer Fabrication -- Applied on A DRAM Company 蔣紘杰; Hon-Jay Jiang
    2011-01-21 晶圓針測參數實驗與模擬分析; Wafer probing analysis of the experiment and simulation parameters 林暘烈; Yang-Lie Lin
    2005-07-01 晶格波茲曼方法之多相流模擬: 液滴碰撞;+B3117Lattice Boltzmann Method for Droplet Collision 潘國隆
    2013-12-01 晶格波茲曼法應用於非等向輻射散射介質之熱輻射研究;Study of Lattice Boltzmann Approach for Thermal Radiative Transfer in an Anisotropic Scattering Participating Medium 何正榮
    2013-06-13 晶片太陽能產業的供應商管理與評量-以G公司為例 陳怡樺; Chen,Yi-hua
    2023-06-29 晶界對多晶石墨烯電性能的影響;Influence of grain boundaries on electrical properties of polycrystalline graphene 何維禎; He, Wei-Chen
    2014-06-16 晶矽覆蓋層對矽中佈植氫離子擴散的抑制效應;Suppression Effect of Si/SiO2 Bilayer on Out-diffusion of Hydrogen Ions Implanted in Silicon 黃冠中; Huang,Kuan-Chung
    顯示項目59101-59125 / 83955. (共3359頁)
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